Ellipsometry & Reflectometry Resource Library

Industry-leading measurement performance for challenging ultra-thin to thin films and multilayers with 100x performance advantage over other non-contact methods

Expedited film thickness and optical constant measurements well suited for in-situ production quality assessment, particularly on thick films in development and production environments and semiconductor wafers

Highly sensitive, repeatable measurement of single-layer thin films and small multilayer structures, capable of characterizing thickness and optical properties even on layers less than a single atomic layer thick

Fully integrated systems combining reflection, transmission, and optional ellipsometric and polarimetry data for measuring absorbing films deposited on transparent substrates

Specialized thin film metrology systems for wafer and CD metrology, designed to meet requirements not measurable with conventional equipment