Bruker’s automated AFMs provide proven industrial metrology solutions for surface roughness measurement, chemical mechanical planarization (CMP), and etch-depth measurements on the most current technology nodes and wafers.
Atomic Force Profiling is the最准确的,非-destructive methodavailable for optimizing and monitoring challenging CMP and etch process steps. Direct measurements do not require test structures or models and can be peformed in the active area of the die for the best sensitivity to process variations.
How Can We Help?
Bruker partners with our customers to solve real-world application issues. We develop next-generation technologies and help customers select the right system and accessories. This partnership continues through training and extended service, long after the tools are sold.
我们的训练有素的团队的支持工程师,达成ication scientists and subject-matter experts are wholly dedicated to maximizing your productivity with system service and upgrades, as well as application support and training.