Super element sensitivity, almost no sample preparation
High speed (large) X-ray element analysis
Analysis of thin film thickness
Bright spot
10
PPM
Detection limit
With background of XRF spectrum diagram below EDS spectra, Micro - XRF trace element analysis can be realized
4
Mm/s
Movement speed
Optional quick sample support large areas of high speed surface analysis
1 nm - 40 microns
The thickness range
Can be analyzed from 1 nm to 40 microns thin film with multi-layer structure
Micro area XRF is SEM EDS analysis of complementary analysis technology
Scanning electron microscope (SEM) the Micro area of X-ray fluorescence (Micro - XRF) technology is a traditional and energy dispersive spectrum (EDS) ability to add nondestructive analysis.The analytical techniques for characterization of unknown elements in the sample is very important, and the size of the unknown sample can be from cm size of non-uniform samples to micron sized particles
X-ray excitation source for trace elements brought higher detection sensitivity (for some elements, detection limit as low as10 parts per million (PPM).At the same time, the spectral range can be future extension (As much as 40 keV), and the detecting depth is deeper
Equipped with X ray tube, combined with micro focus X-ray optics, can be producedSmall beam spot of 30 micronsFlux and high strength
Modularization based on the sample of the piezoelectric, specially designed for installation on the existing SEM samples, make large elements of high-speed X-ray surface analysis "fly to" run,Speed up to 4 mm/SEC.This makes in 50 x 50 mm (or more) of sample area X-ray distribution data possible.At the same time, the light spectrum data and trace elements and/or higher energy X ray data is also included in quick and user-friendly workflow
The sample of the X-ray excitation depth deeper, characterization of the multilayer system possible.1 nm toAs much as 40 micronsThin film samples can be analyzed, and this is source excitation cannot be achieved by the electron beam
Through the Micro - XRF and SEM analysis of rapid sample stage extend your ability
Double beam voltage, including electron beam and X-ray beam, it provides a new possibility for materials characterization - two beam source can be used at the same time to investigate the samples
Use the same detector simultaneously electron beam/micro zone XRF signal acquisition, including the light spectrum data, trace elements and/or higher energy X ray data
EDS quantitative method combining XRF and micro area, the better the light sensitivity of electronic excitation with XRF better characterization of trace element sensitivity, produce more complete sample characterization results
Were characterized and micro zone XRF and beam synchronous surface analysis, combined with the two technical advantages.Using electron beam excitation lighter elements (carbon to sodium), using the micro area XRF inspire the heavier elements
Stripping the spectrum of fengfeng value and the expansion of the spectral range of enables users to see high K line, because they are not complicated and overlapping peaks less
Almost do not need sample preparation - not conductive sample surface, no polishing
Contains no sample and prototype quantitative model