Failure analysis and material properties
Industrial company internal failure analysis and material description group focus on solving problems, in order to help improve the process development and process related problems, in order to help the organization to save costs and increase revenue.
NanoIR3 -sProvide complete nanoscale FTIR, nanoscale chemical imaging and material characterization of platform.It is a combination of two complementary nanoscale infrared technology, AFM - IR and scattering SNOM, as well as the material attribute mapping based on AFM.NanoIR platform for efficient, reliable and efficient in one day.Applications include:
- Nanometer organic pollutants (pops)
- Low dielectric
- Semiconductor materials
- Data storage medium and slides
Organic pollutants is a serious defect of semiconductor, and data storage company problem, because the characterization technique ability is limited.This description is introducedNanoIR3 in suchThe application of the measurement of defects and other semiconductor materials.NanoIR3 system based on a breakthrough technology to 10 nm spatial resolution to obtain the infrared spectrum, the researchers were able to get the material of nanoscale chemical fingerprints.
Using Ann theory, instrument technology patent AFM - IR generated spectrum is directly related to the FTIR spectra of traditional, therefore equivalent to that of standard library (FTIR).In addition to chemical analysis, nanoIR3 also provides with nanoscale spatial resolution of the complementary information mechanical, electrical, thermal and structural properties.
